GENEVA, Dec. 30 -- NIKON-ESSILOR CO.,LTD. (10-8, Ryogoku 2-chome, Sumida-ku, Tokyo1300026), 株式会社ニコン・エシロール (東京都墨田区両国二丁目１０番８号) filed a patent application (PCT/JP2025/020759) for "METHOD FOR STORING VAPOR DEPOSITION SOURCE, AND METHOD FOR MANUFACTURING SPECTACLE LENS" on Jun 09, 2025. With publication no. WO/2025/263370, the details related to the patent application was published on Dec 26, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual ...