GENEVA, Oct. 5 -- NIKON-ESSILOR CO.,LTD. (10-8, Ryogoku 2-chome, Sumida-ku, Tokyo1300026), 株式会社ニコン・エシロール (東京都墨田区両国二丁目１０番８号) filed a patent application (PCT/JP2025/011190) for "EVALUATION METHOD, DESIGN METHOD, SELECTION METHOD, AND MANUFACTURING METHOD FOR SPECTACLE LENS" on Mar 21, 2025. With publication no. WO/2025/205490, the details related to the patent application was published on Oct 02, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intell...