INTERNATIONAL PATENT: NIKON CORPORATION, 株式会社ニコン FILES APPLICATION FOR "EXPOSURE METHOD, EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD"

GENEVA, Sept. 30 -- NIKON CORPORATION (1-5-20, Nishioi, Shinagawa-ku, Tokyo1408601), 株式会社ニコン (東京都品川区西大井１－５－２０) filed a patent application (PCT/JP2025/006324) for "EXPOSURE METHOD, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD" on Feb 25, 2025. With publication no. WO/2025/197436, the details related to the patent application was published on Sep 25, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): KAWADO, Satoshi (c/o NIKON CORPORATION...