INTERNATIONAL PATENT: NIKON CORPORATION, 株式会社ニコン FILES APPLICATION FOR "EXPOSURE METHOD, DEVICE MANUFACTURING METHOD AND EXPOSURE DEVICE"

GENEVA, Nov. 18 -- NIKON CORPORATION (15-3, Konan 2-chome, Minato-ku, Tokyo1086290), 株式会社ニコン (東京都港区港南二丁目１５番３号) filed a patent application (PCT/JP2024/017175) for "EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, AND EXPOSURE DEVICE" on May 08, 2024. With publication no. WO/2025/234036, the details related to the patent application was published on Nov 13, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): TORIU, Taiga (c/o NIKON CORPORATION, 15-3...