INTERNATIONAL PATENT: MURATA MANUFACTURING CO., LTD. FILES APPLICATION FOR "SHALLOW TRENCH ISOLATION USING POROUS SEMICONDUCTOR"

GENEVA, Feb. 25 -- MURATA MANUFACTURING CO., LTD. (10-1, Higashikotari 1-chome, Nagaokakyo-shi, Kyoto6178555) filed a patent application (PCT/JP2024/029227) for "SHALLOW TRENCH ISOLATION USING POROUS SEMICONDUCTOR" on Aug 16, 2024. With publication no. WO/2025/037651, the details related to the patent application was published on Feb 20, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): KOUASSI, Kouassi Sebastien (c/o pSemi Corporation, 9369 Carroll Park Drive, San Diego, California92121), GOKTEPELI, Sinan (3509 Vineland Dr., Austin, Texas78722)

Abstract: Fabrication methods and structures ...