INTERNATIONAL PATENT: MITSUI HIGH-TEC, INC., 株式会社三井ハイテック FILES APPLICATION FOR "SUBSTRATE FOR SEMICONDUCTOR DEVICE, METHOD FOR MANUFACTURING SAME AND SEMICONDUCTOR DEVICE"

GENEVA, Jan. 13 -- MITSUI HIGH-TEC, INC. (10-1, Komine 2-chome, Yahatanishi-ku, Kitakyushu-shi, Fukuoka8078588), 株式会社三井ハイテック (福岡県北九州市八幡西区小嶺二丁目１０番１号) filed a patent application (PCT/JP2025/024229) for "SUBSTRATE FOR SEMICONDUCTOR DEVICE, METHOD FOR MANUFACTURING SAME, AND SEMICONDUCTOR DEVICE" on Jul 04, 2025. With publication no. WO/2026/009977, the details related to the patent application was published on Jan 08, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) sy...