INTERNATIONAL PATENT: MITSUBISHI GAS CHEMICAL COMPANY, INC., 三菱瓦斯化学株式会社 FILES APPLICATION FOR "ETCHING LIQUID AND PRODUCTION METHOD FOR SEMICONDUCTOR DEVICE USING SAME"

GENEVA, Feb. 4 -- MITSUBISHI GAS CHEMICAL COMPANY, INC. (5-2, Marunouchi 2-chome, Chiyoda-ku, Tokyo1008324), 三菱瓦斯化学株式会社 (東京都千代田区丸の内二丁目５番２号) filed a patent application (PCT/JP2024/026313) for "ETCHING LIQUID AND PRODUCTION METHOD FOR SEMICONDUCTOR DEVICE USING SAME" on Jul 23, 2024. With publication no. WO/2025/023241, the details related to the patent application was published on Jan 30, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organ...