INTERNATIONAL PATENT: MITSUBISHI CHEMICAL CORPORATION, 三菱ケミカル株式会社 FILES APPLICATION FOR "POOR METAL CLUSTER COMPOUND, MULTIMER STRUCTURE HAVING SAME, METHOD FOR PRODUCING SAME, PHOTOSENSITIVE COMPOSITION CONTAINING SAME, PATTERN FORMING METHOD USING SAID COMPOSITION, SUBSTRATE AND METHOD FOR PRODUCING SUBSTRATE"

GENEVA, Jan. 6 -- MITSUBISHI CHEMICAL CORPORATION (1-1 Marunouchi 1-chome, Chiyoda-ku, Tokyo1008251), 三菱ケミカル株式会社 (東京都千代田区丸の内一丁目１番１号) filed a patent application (PCT/JP2025/023415) for "POOR METAL CLUSTER COMPOUND, MULTIMER STRUCTURE HAVING SAME, METHOD FOR PRODUCING SAME, PHOTOSENSITIVE COMPOSITION CONTAINING SAME, PATTERN FORMING METHOD USING SAID COMPOSITION, SUBSTRATE, AND METHOD FOR PRODUCING SUBSTRATE" on Jun 30, 2025. With publication no. WO/2026/005063, the details related to the patent application was published on Jan 02, 2026.

Notably, the paten...