GENEVA, Sept. 9 -- MITSUBISHI CHEMICAL CORPORATION (1-1, Marunouchi 1-chome, Chiyoda-ku, Tokyo1008251), 三菱ケミカル株式会社 (東京都千代田区丸の内一丁目１番１号) filed a patent application (PCT/JP2025/006635) for "ETCHING COMPOSITION, METHOD FOR MANUFACTURING ETCHING COMPOSITION, ETCHING METHOD, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, METHOD FOR MANUFACTURING TRANSISTOR, AND USE OF COMPOSITION" on Feb 26, 2025. With publication no. WO/2025/182988, the details related to the patent application was published on Sep 04, 2025.
Notably, the patent application was submitted under...