INTERNATIONAL PATENT: MITSUBISHI CHEMICAL CORPORATION, 三菱ケミカル株式会社 FILES APPLICATION FOR "COMPOUND OR CLUSTER COMPOUND, METHOD FOR PRODUCING COMPOUND, PHOTOSENSITIVE COMPOSITION CONTAINING COMPOUND, PATTERN FORMING METHOD USING COMPOSITION, SUBSTRATE AND METHOD FOR MANUFACTURING SUBSTRATE"

GENEVA, Jan. 6 -- MITSUBISHI CHEMICAL CORPORATION (1-1 Marunouchi 1-chome, Chiyoda-ku, Tokyo1008251), 三菱ケミカル株式会社 (東京都千代田区丸の内一丁目１番１号) filed a patent application (PCT/JP2025/023413) for "COMPOUND OR CLUSTER COMPOUND, METHOD FOR PRODUCING COMPOUND, PHOTOSENSITIVE COMPOSITION CONTAINING COMPOUND, PATTERN FORMING METHOD USING COMPOSITION, SUBSTRATE, AND METHOD FOR MANUFACTURING SUBSTRATE" on Jun 30, 2025. With publication no. WO/2026/005062, the details related to the patent application was published on Jan 02, 2026.

Notably, the patent application was submit...