GENEVA, Aug. 5 -- MICROSOFT TECHNOLOGY LICENSING, LLC (One Microsoft WayRedmond, Washington 98052-6399) filed a patent application (PCT/US2024/059265) for "CALIBRATING THE TOPOLOGICAL GAP PROTOCOL BY OPTIMIZING THE TOPOLOGICAL GAP" on Dec 10, 2024. With publication no. WO/2025/159849, the details related to the patent application was published on Jul 31, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): BARZEGAR, Amin (Microsoft Technology Licensing, LLCOne Microsoft WayRedmond, Washington 98052-6399), PIKULIN, Dmitry (Microsoft Technology Licensing, LLCOne Microsoft WayRedmond, Washington 980...