INTERNATIONAL PATENT: MICRON TECHNOLOGY, INC. FILES APPLICATION FOR "WORDLINE CONTACT ISOLATION STRUCTURE AND METHOD"

GENEVA, Feb. 10 -- MICRON TECHNOLOGY, INC. (8000 So. Federal WayBoise, Idaho 83716-9632) filed a patent application (PCT/US2025/037677) for "WORDLINE CONTACT ISOLATION STRUCTURE AND METHOD" on Jul 15, 2025. With publication no. WO/2026/029974, the details related to the patent application was published on Feb 05, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): HOWDER, Collin (4287 S Sawdust PlaceBoise, Idaho 83716), LI, Andrew L. (2301 W Hillway DrBoise, Idaho 83702), GREENLEE, Jordan D. (2320 W Jean St.Boise, Idaho 83705)

Abstract: Devices and methods are disclosed, including transistors, ...