INTERNATIONAL PATENT: MICRON TECHNOLOGY, INC. FILES APPLICATION FOR "LOW RESISTANCE CONTACT AND METHOD"

GENEVA, Feb. 11 -- MICRON TECHNOLOGY, INC. (8000 So. Federal WayBoise, Idaho 83716-9632) filed a patent application (PCT/US2025/039127) for "LOW RESISTANCE CONTACT AND METHOD" on Jul 24, 2025. With publication no. WO/2026/030121, the details related to the patent application was published on Feb 05, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): MAZZONE, Giovanni (Viale della Vittoria, 720852 Villasanta, MI), WELLS, David H. (3356 S. Chickory WayBoise, Idaho 83706)

Abstract: Apparatus and methods are disclosed, including memory devices and systems with conductive passages. Conductive passa...