GENEVA, Oct. 20 -- MICRON TECHNOLOGY, INC. (8000 S. Federal WayBoise, Idaho 83716-9632) filed a patent application (PCT/US2025/022809) for "FORMING AN INDIUM CHALCOGENIDE FILM" on Apr 02, 2025. With publication no. WO/2025/216956, the details related to the patent application was published on Oct 16, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): QUICK, Timothy A. (8000 S. Federal WayBoise, Idaho 83716-9632), LEHN, Jean-Sebastien Materne (8000 S. Federal WayBoise, Idaho 83716-9632)
Abstract: Methods, systems, and devices for forming an indium chalcogenide film are described. Precursors tha...