INTERNATIONAL PATENT: MICRON TECHNOLOGY, INC. FILES APPLICATION FOR "FERROELECTRIC MEMORY CIRCUITRY AND METHOD USED IN FORMING FERROELECTRIC MEMORY CIRCUITRY"

GENEVA, Oct. 20 -- MICRON TECHNOLOGY, INC. (8000 South Federal WayBoise, ID 83716) filed a patent application (PCT/US2025/019750) for "FERROELECTRIC MEMORY CIRCUITRY AND METHOD USED IN FORMING FERROELECTRIC MEMORY CIRCUITRY" on Mar 13, 2025. With publication no. WO/2025/216835, the details related to the patent application was published on Oct 16, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): LIU, Haitao (6582 E. Escarpment CourtBoise, ID 83716), KARDA, Kamal, M. (2547 E. Red Cedar Lane, Apt. #s301Boise, ID 83716), FAYRUSHIN, Albert (3660 E. Warm Springs Ave.Boise, ID 83716)

Abstract: Fer...