INTERNATIONAL PATENT: MICRON TECHNOLOGY, INC. FILES APPLICATION FOR "DOUBLE-SIDED HIGH-K BLOCKING DIELECTRIC"

GENEVA, Nov. 5 -- MICRON TECHNOLOGY, INC. (8000 So. Federal WayBoise, Idaho 83716-9632) filed a patent application (PCT/US2025/026177) for "DOUBLE-SIDED HIGH-K BLOCKING DIELECTRIC" on Apr 24, 2025. With publication no. WO/2025/226934, the details related to the patent application was published on Oct 30, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): AOULAICHE, Marc (4736 E Pegasus CtBoise, Idaho 83716), LEE, Donghwa (1508 S Loggers Pond Pl, Apt 32Boise, Idaho 83706), VENKATESAN, Srinath (5760 S Hakkasan AveBoise, Idaho 83716), JUNG, Kyubong (4457 E Logger Dr.Boise, Idaho 83716)

Abstract: ...