INTERNATIONAL PATENT: MICRON TECHNOLOGY, INC. FILES APPLICATION FOR "DIGIT LINE FORMATION IN VERTICAL THREE-DIMENSIONAL (3D) MEMORY"

GENEVA, Feb. 4 -- MICRON TECHNOLOGY, INC. (Mail Stop 5078000 South Federal WayP.O. Box 6Boise, Idaho 83707-0006) filed a patent application (PCT/US2025/033489) for "DIGIT LINE FORMATION IN VERTICAL THREE-DIMENSIONAL (3D) MEMORY" on Jun 13, 2025. With publication no. WO/2026/024381, the details related to the patent application was published on Jan 29, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): SPEETJENS, Frank (2044 S Scyene WayBoise, Idaho 87316), LI, Cheng (4321 E Parkcenter BlvdBoise, Idaho 83716), LIAO, Albert (1926 S Tallwood LnBoise, Idaho 83706), DAYCOCK, David A. (5346 Keybridge...