INTERNATIONAL PATENT: MICRON TECHNOLOGY, INC. FILES APPLICATION FOR "DIELECTRIC WINDOWS FOR GROUPS OF VIAS THROUGH SEMICONDUCTOR SUBSTRATES"

GENEVA, July 14 -- MICRON TECHNOLOGY, INC. (8000 S. Federal WayBoise, Idaho 83716-9632) filed a patent application (PCT/US2024/062114) for "DIELECTRIC WINDOWS FOR GROUPS OF VIAS THROUGH SEMICONDUCTOR SUBSTRATES" on Dec 27, 2024. With publication no. WO/2025/147427, the details related to the patent application was published on Jul 10, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): BHUSHAN, Bharat (8000 S. Federal WayBoise, Idaho 83716-9632), PAREKH, Kunal R. (8000 S. Federal WayBoise, Idaho 83716-9632), KEETH, Brent (8000 S. Federal WayBoise, Idaho 83716-9632), SINGH, Akshay N. (8000 S. Fed...