GENEVA, Jan. 20 -- MICRON TECHNOLOGY, INC. (8000 So. Federal WayBoise, Idaho 83716-9632) filed a patent application (PCT/US2025/036468) for "DEFECTIVE WORD LINE SCAN" on Jul 03, 2025. With publication no. WO/2026/015393, the details related to the patent application was published on Jan 15, 2026.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): LIAO, Dongxiang (7429 Stanford PlaceCupertino, California 95014), LIN, Lei (3074 Dickens CourtFremont, California 94536)
Abstract: Systems and methods for providing a memory sub-system controller that selectively performs extrinsic defect scan operations on...