INTERNATIONAL PATENT: MICRON TECHNOLOGY, INC. FILES APPLICATION FOR "CURVED PLUG FOR PROTECTION OF BACKSIDE SOURCE FORMATION OF VERTICAL PLANAR MEMORY CELLS"

GENEVA, Feb. 11 -- MICRON TECHNOLOGY, INC. (8000 S. Federal WayBoise, Idaho 83716-9632) filed a patent application (PCT/US2025/039306) for "CURVED PLUG FOR PROTECTION OF BACKSIDE SOURCE FORMATION OF VERTICAL PLANAR MEMORY CELLS" on Jul 25, 2025. With publication no. WO/2026/030168, the details related to the patent application was published on Feb 05, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): HIGUCHI, Masaaki (8000 S. Federal WayBoise, Idaho 83716-9632), FUKUZUMI, Yoshiaki (8000 S. Federal WayBoise, Idaho 83716-9632), AOULAICHE, Marc (8000 S. Federal WayBoise, Idaho 83716-9632), KING, ...