INTERNATIONAL PATENT: MICRON TECHNOLOGY, INC. FILES APPLICATION FOR "A VERTICAL FERROELECTRIC TRANSISTOR, FERROELECTRIC MEMORY CIRCUITRY AND METHOD USED IN FORMING A VERTICAL FERROELECTRIC TRANSISTOR"

GENEVA, Dec. 10 -- MICRON TECHNOLOGY, INC. (8000 South Federal WayBoise, ID 83716) filed a patent application (PCT/US2025/026452) for "A VERTICAL FERROELECTRIC TRANSISTOR, FERROELECTRIC MEMORY CIRCUITRY, AND METHOD USED IN FORMING A VERTICAL FERROELECTRIC TRANSISTOR" on Apr 25, 2025. With publication no. WO/2025/250284, the details related to the patent application was published on Dec 04, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): AHN, Jae, Young (3722 S. Mill Site Ln.Boise, ID 83716), YUE, Jin (3662 S. Caddis WayBoise, ID 83716), CHOI, Jae, Kyu (2457 S. Swallowtail Ln.Boise, ID 83706)...