GENEVA, June 23 -- MI2-FACTORY GMBH (Hans-Knoll-StraBe 607745 Jena) filed a patent application (PCT/EP2024/085233) for "METHOD FOR IMPLANTING DOPING ATOMS INTO A SUBSTRATE" on Dec 09, 2024. With publication no. WO/2025/125140, the details related to the patent application was published on Jun 19, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): CSATO, Constantin (c/o mi2-factory GmbHMoritz-von-Rohr-Str. 1a07745 Jena), KRIPPENDORF, Florian (c/o mi2-factory GmbHMoritz-von-Rohr-Str. 1a07745 Jena), JAYAPRAKASH, Hitesh (c/o mi2-factory GmbHMoritz-von-Rohr-Str. 1a07745 Jena)
Abstract:
Ion implan...