INTERNATIONAL PATENT: META PLATFORMS TECHNOLOGIES, LLC FILES APPLICATION FOR "APPARATUS, SYSTEM AND METHOD FOR REDUCING SPATIAL REQUIREMENTS OF CIRCUIT BOARDS EMBEDDED IN EYEWEAR DEVICES"

GENEVA, April 21 -- META PLATFORMS TECHNOLOGIES, LLC (1 Meta WayMenlo Park, California 94025) filed a patent application (PCT/US2024/051331) for "APPARATUS, SYSTEM, AND METHOD FOR REDUCING SPATIAL REQUIREMENTS OF CIRCUIT BOARDS EMBEDDED IN EYEWEAR DEVICES" on Oct 15, 2024. With publication no. WO/2025/081177, the details related to the patent application was published on Apr 17, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): CHANNABASAPPA, Eswarappa (1 Meta WayMenlo Park, California 94025), ZHOU, Tao (1 Meta WayMenlo Park, California 94025), AZAD, Umar (1 Meta WayMenlo Park, California 9402...