INTERNATIONAL PATENT: MERCK PATENT GMBH FILES APPLICATION FOR "SUBSTRATE CLEANING LIQUID AND METHODS USING THE SAME FOR MANUFACTURING CLEANED SUBSTRATE AND FOR MANUFACTURING DEVICE"

GENEVA, Feb. 16 -- MERCK PATENT GMBH (Frankfurter Strasse 25064293 Darmstadt) filed a patent application (PCT/EP2024/072442) for "SUBSTRATE CLEANING LIQUID, AND METHODS USING THE SAME FOR MANUFACTURING CLEANED SUBSTRATE AND FOR MANUFACTURING DEVICE" on Aug 08, 2024. With publication no. WO/2025/032170, the details related to the patent application was published on Feb 13, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): NAGAHARA, Tatsuro (c/o Merck Electronics Ltd.3330 ChihamaKakegawa-shi, Shizuoka 437-1412), SUGAHARA, Shinji (c/o Merck Electronics Ltd.3330 ChihamaKakegawa-shi, Shizuoka 437-1...