INTERNATIONAL PATENT: MERCK PATENT GMBH FILES APPLICATION FOR "RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST FILM USING THE SAME"

GENEVA, July 10 -- MERCK PATENT GMBH (Frankfurter Strasse 25064293 Darmstadt) filed a patent application (PCT/EP2024/087220) for "RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST FILM USING THE SAME" on Dec 18, 2024. With publication no. WO/2025/140918, the details related to the patent application was published on Jul 03, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): LIN, HsuanYu (c/o Merck Electronics Ltd.Arco Tower 5F, 1-8-1, Shimomeguro, Meguro-kuTokyo 153-8927), LU, Lei (c/o Merck Electronics Ltd.Arco Tower 5F, 1-8-1, Shimomeguro, Meguro-kuTokyo 153-8927)

Abstract: [Problem] Prov...