INTERNATIONAL PATENT: MERCK PATENT GMBH FILES APPLICATION FOR "RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST FILM USING THE SAME"

GENEVA, May 18 -- MERCK PATENT GMBH (Frankfurter Strasse 25064293 Darmstadt) filed a patent application (PCT/EP2024/081261) for "RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST FILM USING THE SAME" on Nov 06, 2024. With publication no. WO/2025/099025, the details related to the patent application was published on May 15, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): OKAMURA, Toshiya (c/o Merck Electronics Ltd.Arco Tower 5F, 1-8-1, Shimomeguro, Meguro-kuTokyo, 153-8927), LIU, Yida (c/o Merck Electronics Ltd.Arco Tower 5F, 1-8-1, Shimomeguro, Meguro-kuTokyo, 153-8927)

Abstract: Provide...