INTERNATIONAL PATENT: MERCK PATENT GMBH FILES APPLICATION FOR "ELECTRONIC DEVICE MANUFACTURING AQUEOUS SOLUTION, METHOD FOR PRODUCING RESIST PATTERN AND METHOD FOR MANUFACTURING DEVICE"

GENEVA, Nov. 10 -- MERCK PATENT GMBH (Frankfurter Strasse 25064293 Darmstadt) filed a patent application (PCT/EP2025/061654) for "ELECTRONIC DEVICE MANUFACTURING AQUEOUS SOLUTION, METHOD FOR PRODUCING RESIST PATTERN, AND METHOD FOR MANUFACTURING DEVICE" on Apr 29, 2025. With publication no. WO/2025/228950, the details related to the patent application was published on Nov 06, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): JIN, Zhi Yue (c/o Merck Electronics Ltd.3330 Chihama, Kakegawa-shiSHIZUOKA, Shizuoka 437-1412), YANAGITA, Hiroshi (c/o Merck Electronics Ltd.3330 Chihama, Kakegawa-shiSHIZ...