INTERNATIONAL PATENT: MERCK PATENT GMBH FILES APPLICATION FOR "COMPOSITIONS FOR REMOVING PHOTORESIST AND ETCH RESIDUES, METHODS OF USING AND USE THEREOF"

GENEVA, June 2 -- MERCK PATENT GMBH (Frankfurter Strasse 25064293 Darmstadt) filed a patent application (PCT/EP2024/082457) for "COMPOSITIONS FOR REMOVING PHOTORESIST AND ETCH RESIDUES, METHODS OF USING AND USE THEREOF" on Nov 15, 2024. With publication no. WO/2025/108836, the details related to the patent application was published on May 30, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): YANG, Jamin (c/o Versum Materials US, LLC8555 South River ParkwayTempe, Arizona 85284), CAO, Yuanmei (c/o Versum Materials US, LLC8555 South River ParkwayTempe, Arizona 85284), SUN, Laisheng (c/o Versum Ma...