INTERNATIONAL PATENT: MENLO MICROSYSTEMS, INC. FILES APPLICATION FOR "TWO STAGE PLATING FOR REDUCED NI AND NIO LAYER FORMATION"

GENEVA, Jan. 20 -- MENLO MICROSYSTEMS, INC. (49 DiscoverySuite 100Irvine, California 92618) filed a patent application (PCT/US2025/036632) for "TWO STAGE PLATING FOR REDUCED NI AND NIO LAYER FORMATION" on Jul 07, 2025. With publication no. WO/2026/015442, the details related to the patent application was published on Jan 15, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): BREWER, Joleyn Eileen (257 Fuller RoadNanoFab East, Suite 1602Albany, New York 12203), FOUST, Donald (257 Fuller RoadNanoFab East, Suite 1602Albany, New York 12203), NASSAR, Christopher (257 Fuller RoadNanoFab East, Suite 1...