INTERNATIONAL PATENT: MELEXIS TECHNOLOGIES SA FILES APPLICATION FOR "SEMICONDUCTOR SUBSTRATE WITH INTEGRATED MAGNETIC FLUX CONCENTRATOR AND METHOD FOR PRODUCING SAME"

GENEVA, Nov. 17 -- MELEXIS TECHNOLOGIES SA (Chemin de Buchaux 382022 Bevaix) filed a patent application (PCT/EP2025/062672) for "SEMICONDUCTOR SUBSTRATE WITH INTEGRATED MAGNETIC FLUX CONCENTRATOR, AND METHOD FOR PRODUCING SAME" on May 08, 2025. With publication no. WO/2025/233482, the details related to the patent application was published on Nov 13, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): VAN DER WIEL, Appo (c/o Melexis Technologies NVTransportstraat 1Poort West-Limburg 1371-13723980 Tessenderlo-Ham)

Abstract: Method of producing a semiconductor wafer with a magnetic flux concentra...