INTERNATIONAL PATENT: MATERION ADVANCED MATERIALS GERMANY GMBH FILES APPLICATION FOR "AG-BASED ALLOY SPUTTERING TARGET FOR SPUTTERING OF LAYERS WITH IMPROVED REFLECTIVITY"

GENEVA, Sept. 8 -- MATERION ADVANCED MATERIALS GERMANY GMBH (BorsigstraBe 1063755 Alzenau) filed a patent application (PCT/EP2025/055516) for "AG-BASED ALLOY SPUTTERING TARGET FOR SPUTTERING OF LAYERS WITH IMPROVED REFLECTIVITY" on Feb 28, 2025. With publication no. WO/2025/181333, the details related to the patent application was published on Sep 04, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): KONIETZKA, Uwe (Bergstr. 1A63826 Geiselbach), WAGNER, Jens (Marbachweg 59B60435 Frankfurt), SCHLOTT, Martin (Scharfensteinerstr. 3363075 Offenbach)

Abstract: The present invention relates to a ...