GENEVA, Sept. 8 -- MATERION ADVANCED MATERIALS GERMANY GMBH (BorsigstraBe 1063755 Alzenau) filed a patent application (PCT/EP2025/055515) for "AG ALLOY SPUTTERING TARGET WITH HIGH HOMOGENEITY" on Feb 28, 2025. With publication no. WO/2025/181332, the details related to the patent application was published on Sep 04, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): KONIETZKA, Uwe (Bergstr. 1A63826 Geiselbach), SCHLOTT, Martin (Scharfensteinerstr. 3363075 Offenbach), SIMONS, Christoph (Schone Aussicht 363599 Biebergemund)
Abstract:
The present invention relates to a sputtering target with hi...