INTERNATIONAL PATENT: MACDERMID ENTHONE INC. FILES APPLICATION FOR "SUPPRESSION OF MANGANESE DIOXIDE FORMATION IN MANGANESE (III)-BASED ETCHING SOLUTIONS"

GENEVA, June 24 -- MACDERMID ENTHONE INC. (245 Freight StreetWaterbury, CT 06502) filed a patent application (PCT/US2024/043422) for "SUPPRESSION OF MANGANESE DIOXIDE FORMATION IN MANGANESE (III)-BASED ETCHING SOLUTIONS" on Aug 22, 2024. With publication no. WO/2025/128164, the details related to the patent application was published on Jun 19, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): HERDMAN, Roderick, D. (3 Cedar CrescentKingsbury, Tamworth, Staffordshire B78 2JQ), CHAPANERI, Roshan, V. (49 Okehampton RoadCoventry CV3 5AT)

Abstract: A.method is provided for stabilizing manganese(I...