GENEVA, June 18 -- LU, Feng (3700 Parkview Lane, Apt 25DIrvine, California 92612-1838) filed a patent application (PCT/US2024/058181) for "ORGANOTIN POLYMER PHOTORESIST COMPOSITION FOR PHOTOLITHOGRAPHY PATTERNING" on Dec 03, 2024. With publication no. WO/2025/122452, the details related to the patent application was published on Jun 12, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): LU, Feng (3700 Parkview Lane, Apt 25DIrvine, California 92612-1838)
Abstract:
An organotin polymer photoresist composition for photolithography patterning is described, wherein organotin polymer photoresist c...