INTERNATIONAL PATENT: LU, FENG FILES APPLICATION FOR "ORGANOTIN PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTOLITHOGRAPHY PATTERN"

GENEVA, Feb. 4 -- LU, Feng (3700 Parkview Lane, Apt 25DIrvine, California 92612-1838) filed a patent application (PCT/US2024/038785) for "ORGANOTIN PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTOLITHOGRAPHY PATTERN" on Jul 19, 2024. With publication no. WO/2025/024290, the details related to the patent application was published on Jan 30, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): LU, Feng (3700 Parkview Lane, Apt 25DIrvine, California 92612-1838)

Abstract: An organotin photoresist composition and a method of forming photolithography pattern are described. The organotin photoresi...