INTERNATIONAL PATENT: LITEQ B.V. FILES APPLICATION FOR "MEASUREMENT SYSTEMS, LITHOGRAPHY SYSTEMS AND METHODS OF MEASURING DISPLACEMENT OF A TARGET STRUCTURE OF THE LITHOGRAPHY SYSTEMS"

GENEVA, Jan. 5 -- LITEQ B.V. (Hooge Zijde 325626DC Eindhoven) filed a patent application (PCT/EP2025/067943) for "MEASUREMENT SYSTEMS, LITHOGRAPHY SYSTEMS, AND METHODS OF MEASURING DISPLACEMENT OF A TARGET STRUCTURE OF THE LITHOGRAPHY SYSTEMS" on Jun 25, 2025. With publication no. WO/2026/003093, the details related to the patent application was published on Jan 02, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): VERMEER, Tessa Denise (c/o LITEQ B.V.Hooge Zijde 325626 DC Eindhoven), DE BOEIJ, Jeroen (c/o LITEQ B.V.Hooge Zijde 325626 DC Eindhoven), CACACE, Leonard Antonino (c/o LITEQ B.V.Hoog...