INTERNATIONAL PATENT: LIN, JING-JYR, 林净植 FILES APPLICATION FOR "FACE MASK STRUCTURE HAVING NOSE PAD"

GENEVA, Nov. 2 -- LIN, Jing-Jyr (2F., No.27-1, Zhaiming St.Daxi TownshipTaoyuan, Taiwan), 林净植 (中国台湾省桃园县大溪镇斋明街27-1号2楼) filed a patent application (PCT/CN2025/085826) for "FACE MASK STRUCTURE HAVING NOSE PAD" on Mar 28, 2025. With publication no. WO/2025/223152, the details related to the patent application was published on Oct 30, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): LIN, Jing-Jyr (2F., No.27-1, Zhaiming St.Daxi TownshipTaoyuan, Taiwan), 林Ñ...