INTERNATIONAL PATENT: LAM RESEARCH CORPORATION FILES APPLICATION FOR "SELECTIVE ETCH OF STACK BELOW METAL MASK USING OXYGEN AND FLUORINE"

GENEVA, April 16 -- LAM RESEARCH CORPORATION (4650 Cushing ParkwayFremont, California 94538) filed a patent application (PCT/US2024/048194) for "SELECTIVE ETCH OF STACK BELOW METAL MASK USING OXYGEN AND FLUORINE" on Sep 24, 2024. With publication no. WO/2025/075828, the details related to the patent application was published on Apr 10, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): WANG, Mingmei (c/o Lam Research Corporation4650 Cushing Parkway, M/S CA-1Fremont, California 94538), SINGH, Harmeet (c/o Lam Research Corporation4650 Cushing Parkway, M/S CA-1Fremont, California 94538)

Abstract:...