INTERNATIONAL PATENT: LAM RESEARCH CORPORATION FILES APPLICATION FOR "NITRIDE LAYER FORMATION BY CYCLIC DEPOSITION AND TREATMENT"

GENEVA, Jan. 20 -- LAM RESEARCH CORPORATION (4650 Cushing ParkwayFremont, California 94538) filed a patent application (PCT/US2025/036516) for "NITRIDE LAYER FORMATION BY CYCLIC DEPOSITION AND TREATMENT" on Jul 03, 2025. With publication no. WO/2026/015403, the details related to the patent application was published on Jan 15, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): CHURCH, Jonathan (4650 Cushing ParkwayFremont, California 94538)

Abstract: A method for generating a mold stack on a substrate is presented. The mold stack comprises alternating layers of silicon nitride and silicon oxid...