INTERNATIONAL PATENT: LAM RESEARCH CORPORATION FILES APPLICATION FOR "IN-SITU CARBON LINER FOR IMPROVED HIGH ASPECT RATIO ETCH WITH BOW CONTROL"

GENEVA, June 25 -- LAM RESEARCH CORPORATION (4650 Cushing ParkwayFremont, California 94538) filed a patent application (PCT/US2024/058601) for "IN-SITU CARBON LINER FOR IMPROVED HIGH ASPECT RATIO ETCH WITH BOW CONTROL" on Dec 05, 2024. With publication no. WO/2025/128395, the details related to the patent application was published on Jun 19, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): WANG, Mingmei (c/o Lam Research Corporation4650 Cushing Parkway, M/S CA-1Fremont, California 94538), JAWALI, Puneet N. (c/o Lam Research Corporation4650 Cushing Parkway, M/S CA-1Fremont, California 94538) ...