INTERNATIONAL PATENT: L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE FILES APPLICATION FOR "DIELECTRIC PLASMA ETCHING USING C2H2F2"

GENEVA, March 9 -- L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE (75 Quai d'Orsay75007 Paris) filed a patent application (PCT/IB2024/000466) for "DIELECTRIC PLASMA ETCHING USING C2H2F2 " on Aug 28, 2024. With publication no. WO/2025/046295, the details related to the patent application was published on Mar 06, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): STAFFORD, Nathan (200 GBC DriveNewark, DE 19702), JENNINGS, Colin (200 GBC DriveNewark, DE 19702), BILTEK, Scott (200 GBC DriveNewark, DE 19702), NGUYEN, Phong (200 GBC DriveNewark, DE 19702) ...