INTERNATIONAL PATENT: KONINKLIJKE PHILIPS N.V. FILES APPLICATION FOR "MASK PROVIDING POSITIVE AIRWAY PRESSURE WITH SENSOR AND AN INTEGRATED MONITOR"

GENEVA, Feb. 3 -- KONINKLIJKE PHILIPS N.V. (High Tech Campus 525656 AG Eindhoven) filed a patent application (PCT/EP2024/070050) for "MASK PROVIDING POSITIVE AIRWAY PRESSURE WITH SENSOR AND AN INTEGRATED MONITOR" on Jul 15, 2024. With publication no. WO/2025/021578, the details related to the patent application was published on Jan 30, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): COCHRAN, Jonas Dean (c/o Philips International B.V. Intellectual Property and StandardsHigh Tech Campus 525656 AG Eindhoven), BANET, Matthew (c/o Philips International B.V. Intellectual Property and StandardsHigh...