INTERNATIONAL PATENT: KOKUSAI ELECTRIC CORPORATION, 株式会社ＫＯＫＵＳＡＩ ＥＬＥＣＴＲＩＣ FILES APPLICATION FOR "SUBSTRATE PROCESSING METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD, HARD MASK FORMATION METHOD, SUBSTRATE PROCESSING DEVICE AND PROGRAM"

GENEVA, Sept. 21 -- KOKUSAI ELECTRIC CORPORATION (3-4, Kandakaji-cho, Chiyoda-ku, Tokyo1010045), 株式会社ＫＯＫＵＳＡＩ　ＥＬＥＣＴＲＩＣ (東京都千代田区神田鍛冶町３丁目４番地) filed a patent application (PCT/JP2024/033989) for "SUBSTRATE PROCESSING METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD, HARD MASK FORMATION METHOD, SUBSTRATE PROCESSING DEVICE, AND PROGRAM" on Sep 24, 2024. With publication no. WO/2025/191892, the details related to the patent application was published on Sep 18, 2025.

Notably, the patent...