INTERNATIONAL PATENT: KLA CORPORATION FILES APPLICATION FOR "SYSTEM AND METHOD FOR OVERLAY MEASUREMENT USING DESIGN DATA AND DEEP LEARNING SEGMENTATION"

GENEVA, Dec. 31 -- KLA CORPORATION (One Technology DriveMilpitas, California 95035) filed a patent application (PCT/US2025/033699) for "SYSTEM AND METHOD FOR OVERLAY MEASUREMENT USING DESIGN DATA AND DEEP LEARNING SEGMENTATION" on Jun 16, 2025. With publication no. WO/2025/264520, the details related to the patent application was published on Dec 26, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): YATI, Arpit (1/480 Vardan KhandGomti NagarLucknow 226010)

Abstract: A method for overlay measuring using design data and deep learning segmentation is disclosed. The method may render selected des...