INTERNATIONAL PATENT: KLA CORPORATION FILES APPLICATION FOR "SYSTEM AND METHOD FOR MULTI-MERIT ADAPTIVE SAMPLING IN OVERLAY METROLOGY"

GENEVA, Dec. 10 -- KLA CORPORATION (One Technology DriveMilpitas, California 95035) filed a patent application (PCT/US2025/031084) for "SYSTEM AND METHOD FOR MULTI-MERIT ADAPTIVE SAMPLING IN OVERLAY METROLOGY" on May 28, 2025. With publication no. WO/2025/250568, the details related to the patent application was published on Dec 04, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): IV, Michael (Ofakim 103677008 Nesher), GUTMAN, Nadav (11 Dror Unit 123091784 Zichron Ya'aqov), KLEIN, Dana (Alexander Yanai 23, Carmeliya34816 Haifa), LINDEN, Yatir (169 NE Ironcreek Ter.Hillsboro, Oregon 97124), UZ...