INTERNATIONAL PATENT: KLA CORPORATION FILES APPLICATION FOR "SYSTEM AND METHOD FOR DETERMINING OVERLAY MEASUREMENT OF A SCANNING TARGET USING MULTIPLE WAVELENGTHS"

GENEVA, Nov. 4 -- KLA CORPORATION (One Technology DriveMilpitas, California 95035) filed a patent application (PCT/US2025/022844) for "SYSTEM AND METHOD FOR DETERMINING OVERLAY MEASUREMENT OF A SCANNING TARGET USING MULTIPLE WAVELENGTHS" on Apr 03, 2025. With publication no. WO/2025/226420, the details related to the patent application was published on Oct 30, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): GDOR, Itay (317 Bait Halevi4287000 Tel Aviv), LUBASHEVSKY, Yuval (22 Smolenskin St.3436606 Haifa), ISAKOVITCH, Nickolai (317 Bait Halevi4287000 Tel-Aviv), GRAUER, Yoav (Golda Meir 2734982...