INTERNATIONAL PATENT: KLA CORPORATION FILES APPLICATION FOR "SPECTROSCOPIC ELLIPSOMETRY WITH DETECTOR RESOLVED NUMERICAL APERTURE FOR DEEP STRUCTURE METROLOGY"

GENEVA, April 16 -- KLA CORPORATION (One Technology DriveMilpitas, California 95035) filed a patent application (PCT/US2024/049177) for "SPECTROSCOPIC ELLIPSOMETRY WITH DETECTOR RESOLVED NUMERICAL APERTURE FOR DEEP STRUCTURE METROLOGY" on Sep 30, 2024. With publication no. WO/2025/075891, the details related to the patent application was published on Apr 10, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): TAN, Zhengquan (20306 Clifden WayCupertino, California 95014)

Abstract: Methods and systems for performing spectroscopic ellipsometry measurements of semiconductor structures with a coll...