INTERNATIONAL PATENT: KLA CORPORATION FILES APPLICATION FOR "SIDE-BY-SIDE OFF-CENTER DIE OVERLAY TARGET"

GENEVA, Sept. 10 -- KLA CORPORATION (One Technology DriveMilpitas, California 95035) filed a patent application (PCT/US2025/017106) for "SIDE-BY-SIDE OFF-CENTER DIE OVERLAY TARGET" on Feb 24, 2025. With publication no. WO/2025/184049, the details related to the patent application was published on Sep 04, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): HAJAJ, Eitan (Golany Street, 28 B7848022 Ashqelon), VOLKOVICH, Roie (Hazavitan 11a3809916 Hadera)

Abstract: An overlay metrology system and method are disclosed. The overlay metrology system may include a detector and a controller. The contr...