GENEVA, March 10 -- KLA CORPORATION (One Technology DriveMilpitas, California 95035) filed a patent application (PCT/US2024/042590) for "ROBUST IMAGE-TO-DESIGN ALIGNMENT FOR DRAM" on Aug 16, 2024. With publication no. WO/2025/049127, the details related to the patent application was published on Mar 06, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): LEE, Hucheng (1159 Kentwood AvenueCupertino, California 95014), JIN, Huan (2218 Forino DriveDublin, California 94568)
Abstract:
Methods and systems for alignment for semiconductor applications are provided. One method includes determining dif...