INTERNATIONAL PATENT: KLA CORPORATION FILES APPLICATION FOR "POLARIZATION CONTROL AND OPTIMIZATION FOR PHOTOMASK DEFECT DETECTION"

GENEVA, Jan. 13 -- KLA CORPORATION (One Technology DriveMilpitas, California 95035) filed a patent application (PCT/US2025/035829) for "POLARIZATION CONTROL AND OPTIMIZATION FOR PHOTOMASK DEFECT DETECTION" on Jun 30, 2025. With publication no. WO/2026/010836, the details related to the patent application was published on Jan 08, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): XIE, Yun (Room 909, No.218 HaiQu RoadPudong, Shanghai 200120), HUANG, Haifeng (2997 Rivers Bend CircleLivermore, CA 94550), YE, Xin (Room 302, Building No.24Yang Guang San CunShanghai, Shanghai 200120), ZHANG, Heng (Roo...